NobleMetalWorks
Well-known member
I would like to know more about more about DCP or Direct Current Plasma Emission Spectrometer so I thought to start a thread on the subject. I am familiar with, and have used ICP-MS but it does have issues specially with complex matrix samples . I have recently come into contact with someone who uses DCP instead of ICP and does so for the following reasons:
It seems there are very few people who even use DCP and even fewer people who refurbish the equipment, as well I cannot find any manufacturer of the equipment itself. Any information in this regard would be greatly appreciate also.
- DCP has a more rugged Sampling System (Nebulizer, Spray Chamber, Aerosol Chimney... made from inert Plastic & Graphite), to easily handle any high-Acid (including HF), high-Salt (10-20%) Solutions without Physical or Chemical interference.
- DCP’s ultra-high Optical Resolution of the Echelle Spectrometer is ~10x greater than most ICP, and this eliminates errors due to Spectral Interference where Wavelength from one Element (Fe, for example) will give a false reading for another Element (Au, which has its Wavelength only 0.001nm away from Fe)
- DCP is simpler, uses less Ar than ICP, so it is less expensive to operate.
- There is high e-density and less ionization than ICP (more "useful" for 1A and 2A elements by a factor of 10 to 100 times).
It seems there are very few people who even use DCP and even fewer people who refurbish the equipment, as well I cannot find any manufacturer of the equipment itself. Any information in this regard would be greatly appreciate also.